High Density And High Uniformity Al2o3 Sputtering Target

Our offered range of High Density And High Uniformity Al2O3 Sputtering Target is available with following specifications :-

Technical indicators
purity 99.99% Relative density >99.9%
Cut surface flatness 3.2Ra
Tolerance A 0.1mm grain size uniform
Material Al2O3 Brand MAT-CN
Origin Nanchang Jiangxi China

Specifications
Size 1: diameter <360mm
thickness> 1 mm
(wafer / round table / rod)
Size 2: length <300mm
width <300mm
thickness> 1mm
(rectangular / sheet /splicing)
Size 3: outer diameter <360mm
inner diameter> 1mm
length> 1 mm
(pipe / ring / rotatable targets)
Size 4:be customized according to user needs, sample processing, to map processing

Minimum order quantity
1 piece,large concessions

Supply capacity
the same batch, the same material, continuous and reliable supply; 100 kg / month min

Delivery time
3 weeks after payment,excluding special materials

Production process
vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments
various models magnetron sputtering equipment, etc.

Product uses
industrial-grade coating, experiments or research level AL2O3 target electronics, optoelectronics, military, decorative, functional film