Plasma Cleaner, 40 Khz (Cpc-a)

Plasma cleaners are widely used in many fields, including materialogy, photology, electronics, medicine and pharmacology, environics and biology.

Application
CIF plasma cleaners are ideal to be used in:
i Surface cleaning
i Surface activation
i Bonding
i Removing photoresist
i Metal reduction
i Simple etching
i Sterilization of apparatus
i Removing surface organics
i Hydrophobic experiment
i Pre-treatment of film processing

Function & Features
i Smart programmed controller. The whole process can be programmed and run automatically. Combined system control including key touch panel, 4.3a LCD display screen and dual float flow meters;
i Two modes available at usera s option: manual and auto.
i Automatic matcher.
i Honeywell vacuum pressure sensor.
i Dwyer gas rotameter.
i Unique dual gas control ensures very stable gas flow.
i Patented arc-shaped plate electrode ensures thoroughly cleaning.
i Chamber piping and valves are all made of high-quality stainless steel.
i Digital float flowmeter is optional.
i Sample stage lifting device is optional.
i Safety protection mechanism automatically switches off electrical power when the chamber door is open.
i No consumables, very low operation cost. Dona t need special maintenance.
i 12 months warranty.

Technical Specifications
Chamber Size (mm): 300xI 100
Capacity, Liter: 2.6
MatcherAuto: Auto
RF Frequency: 40 Khz
RF Power: 10-200W stepless adjustable
Power Supply: 220V, 50/60 Hz
Current: 1.2 A
Time Setting:1-99 min, 59 sec
Gas Stable Time:1 min
Vacuum Degree:Less than 100 pa
Plasma Excitation Mode:Capacitive
Dimension ( LxWxH, mm):Product size: 550x520x285mm; Shipping size: 690x630x450mm
Net Weight (kgs):15