Eco-friendly Uv Laser Pattern Generator For Fast Patterning

We are engaged in offering excellent quality UV Laser Pattern Generator For Fast Patterning to our valuable clients. iGrapher is the UV laser pattern generator, either for micro-structure of mask preparations, or for micro-nano-lithography. It has installed the functional optical heads, applied with spatial light modulator(SLM) technology to support the micro-patterning lithography, and phase light modulation with the interference technology to write directly the nanoscale period structures.
The almost outdated pattern generators use a system of raster scan technology, which are common today. These systems use a focused laser beam to write arbitrary microstructures with minimum features sizes down to 0.5um on almost any resist materials.
The e-Beam lithography(EBL) is an important method for writing nanoscale structures, but at a very slow writing speed and a high cost of ownership. For structures as small as 0.25um, the latest method is to use the parallel patterning of SLM technology and phase light modulation technology offering a very high resolution, image quality and throughput. The SLM technology applied in iGrapher is the basis of a new photomask pattern generation technology that is fundamentally different from traditional AOM technologies. The SLM technology unites laser -beam productivity with e-beam-like high-resolution, creating a powerful photomask pattern generator with the potential to extend through many generations of technology.