Mc100 Dli-cvd And Dli-ald System

Our firm is manufacturing and supplying of MC100 DLI-CVD and DLI-ALD System to our patrons. The Annealsys MC100 is a 100 mm DLI-CVD and DLI-ALD system designed for research and development applications. It offers the capability to deposit a wide range of materials with low cost of ownership.
The Direct Liquid Injection (DLI) vaporizers provide perfect control of precursor flow and allows utilization of low vapor pressure and diluted chemical precursors. The fast switching of the precursor vapor flows associated with the by-pass valve provided perfect interface control for deposition of nanolaminates.
The thermally controlled wall reactor provides efficient utilization of the chemical precursor and limited deposition on the process chamber walls.
The automated liquid panel has been optimized for reduced consumption of chemical precursors. The no dead volume design provides full rising capability for easy change of chemicals and refilling of the precursor tanks in a glove box.
Outstanding technical and process support to our customers
Applications:
- Simple and multi-metallic oxides
- Metals, nitrides and alloys
- Nanotubes and nanowires
- Etc.