Mc200 Thermally Controlled Wall Reactor

We are producing and supplying a wide range of MC200 Thermally Controlled Wall Reactor to our patrons. The Annealsys MC200 is a 200 mm thermally controlled wall reactor especially developed to meet the requirements of research and development units for DLI-CVD and DLI-ALD processes.
The Direct Liquid Injection (DLI) vaporizers provide perfect control of precursor flow and allows utilization of low vapor pressure and diluted chemical precursors. The fast switching of the precursor vapor flows associated with the by-pass valve provided perfect interface control for deposition of nanolaminates.
A capacitance plasma option offer PE-CVD et PE-ALD capabilities for reducing the deposition temperature.
The automated liquid panel has been optimized for reduced consumption of chemical precursors. The no dead volume design provides full rising capability for easy change of chemicals and refilling of the precursor tanks in a glove box.
Loadlock and glove box substrate loading are available.
Outstanding technical and process support to our customers.
Applications:
- Simple and multi-metallic oxides
- Metals, nitrides and alloys
- Nanotubes and nanowires
- Etc.